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Persistent URL	http://purl.org/net/epubs/work/30253
Record Status	Checked
Record Id	30253
Title	Dopant Behaviour and Damage Annealing in Silicon Implanted with 1keV Asenic
Contributors	S Whelan (Salford U.), V Privitera, G Mannio, M Italia, C Bongiorno, E J H Collart (Applied Materials), J A van den Berg (Salford U.)
Abstract
Organisation	CCLRC , SND , MEIS
Keywords	Physics
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Language	English (EN)

Type	Details	URI(s)	Local file(s)	Year
Journal Article	Nucl Instrum Meth B 186, no. 1-4 (2001): 271-275.	doi:10.1016/S0168-583X(01)00877-1		2001