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Persistent URL http://purl.org/net/epubs/work/49514
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Record Id 49514
Title Chemical and optical profiling of ultra thin high-k dielectrics on silicon
Contributors
Abstract The thickness of HfO2 and hafnium silicate HfxSi1-xOy thin films with a range of compositions are investigated using three complementary analytical techniques. We compare results obtained from Medium Energy Ion Scattering spectroscopy, spectroellipsometry and high-resolution Transmission Electron Microscopy. Our results demonstrate that the thickness of the silicate layers decreases with the Hf content.
Organisation SRS , MEIS , STFC
Keywords Materials
Funding Information
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Language English (EN)
Type Details URI(s) Local file(s) Year
Journal Article Thin Solid Films 517 (2008): 459-461. doi:10.1016/j.tsf.2008.08.048 2008
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Science and Technology Facilities Council Switchboard: 01793 442000