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Persistent URL http://purl.org/net/epubs/work/30263
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Record Id 30263
Title Damage of alumina films by medium energy hydrogen and helium ions
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Abstract Following previous observations of detachment of amorphous, anodic alumina films from aluminium by 100 keV H+ ions, further experiments have been carried out using H+, D+, 3He+ and 4He+ ions, at energies in the range of 0.5–270 keV, to irradiate anodized aluminium with oxides of thickness from 30 to 500 nm. Surface damage was investigated by field-emission-gun scanning electron microscopy and transmission electron microscopy. Detachment of the oxide, which takes place close to, or at, the metal/oxide interface, occurred only following irradiation by H+ and D+ ions, with the ions being stopped in the metal rather than the oxide. The threshold fluence for initiation of detachment is approximately 3×1015 ions cm?2. No detachment was detected following irradiations by 3He+ and 4He+ ions with fluences up to 5×1016 ions cm?2 and ranges similar to those of H+ and D+ ions, although vacancy production is much greater for helium ions. These findings indicate that detachment is associated with accumulation of hydrogen species in the vicinity of the metal/oxide interface, rather than condensation of vacancies. Such behaviour is consistent with the expected mobility of hydrogen, but not of helium, in aluminium near room temperature.
Organisation CCLRC , SND , MEIS
Keywords Physics
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Language English (EN)
Type Details URI(s) Local file(s) Year
Journal Article Nucl Instrum Meth B 197, no. 3-4 (2002): 265-270. doi:10.1016/S0168-583X(02)01486-6 2002