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Persistent URL http://purl.org/net/epubs/work/43798
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Record Id 43798
Title Damage formation and annealing studies of low energy ion implants in silicon using medium energy ion scattering
Organisation CCLRC , MEIS
Keywords Physics
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Language English (EN)
Type Details URI(s) Local file(s) Year
Thesis PhD, Salford U., 2006. 2006