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Persistent URL http://purl.org/net/epubs/work/53759
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Record Id 53759
Title Range and damage distributions in ultra-low energy boron implantation into silicon
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Abstract
Organisation CCLRC , MEIS
Keywords Materials
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Language English (EN)
Type Details URI(s) Local file(s) Year
Book Chapter or Section In Ion Implantation Technology - 96. chapter 213, 527-530. 1997. 1997
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