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Persistent URL http://purl.org/net/epubs/work/54616
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Record Id 54616
Title A new chemically amplified resist for high resolution patterning by E-beam lithography
Organisation EID , STFC
Keywords UV1116 , Electron Beam Lithography , Contrast , Sensitivity , High Resolution Patterning
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Language English (EN)
Type Details URI(s) Local file(s) Year
Journal Article Journal of Nanoscience and Nanotechnology 10, no. 11, Sp. Iss. SI (2010): 7130-7133. doi:10.1166/jnn.2010.2846 2010